发明名称 |
Heat-resistant negative photoresist composition, photosensitive substrate, and process for forming negative pattern |
摘要 |
A photoresist composition which can form a negative pattern with good heat resistance upon irradiation with actinic rays can be prepared by adding a 4-(2'-nitrophenyl)-1-alkyl (or alkoxyl)-4-dihydropyridine as a photosensitive compound which shows basicity by the irradiation with actinic rays to a resin component comprising a polyimide precursor having a specific structure.
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申请公布号 |
US5665523(A) |
申请公布日期 |
1997.09.09 |
申请号 |
US19960751555 |
申请日期 |
1996.11.18 |
申请人 |
NITTO DENKO CORPORATION |
发明人 |
OMOTE, TOSHIHIKO;FUJII, HIROFUMI |
分类号 |
G03F7/004;G03F7/038;G03F7/38;H01L21/027;(IPC1-7):G03F7/004;G03F7/34 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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