| 摘要 |
PROBLEM TO BE SOLVED: To produce a sputtering target for forming a ferroelectric film free from the generation of peeling and cracking even being subjected to sputtering by high electric power and to provide a method for producing the same. SOLUTION: BaCO3 powder having <=50ppm S content, SrCO3 powder and TiO2 powder are used to produce a sputtering target for forming a ferromagnetic film composed of BaTi double oxide, SrTi double oxide and BaSrTi triple oxide, and the content of S in the obtd. sputtering target for forming a ferroelectric film composed of BaTi double oxide, SrTi double oxide and BaSrTi triple oxide is limited to <=50ppm. |
