| 摘要 |
PROBLEM TO BE SOLVED: To provide a light intensity distribution simulating method for finding of a light intensity distribution of an object to be subjected to light exposure in a projection aligner, which can efficiently find the light intensity distribution. SOLUTION: A photomask region 26 corresponding to a region on a photoresist film whose light intensity distribution is to be found is divided into divided regions 27VW having the same size, a region including a surrounding region 28VW on the photoresist film on which the divided regions 27VW are projected and which has an unnegligible effect on its light intensity is set as a unit calculation region 29VW, a mutual transmission coefficient is found for a unit calculation region 2911 , and a light intensity on the photoresist film by the photomask is calculated for each of the divided regions 27VW with use of the mutual transmission coefficient. |
