MUSTER-KORREKTURVERFAHREN

摘要

The pattern correction technique includes a step of covering one surface of the substrate (12) including the pattern (20) with a protective film (60) for correction, a step of exposing the one surface of the substrate (12) at a part where a defect (30, 40, 50) exists, a step of filling the part of the exposed one surface of the substrate (12) with a correcting material (70) and a step of removing the protective film (60) for correction. Either one of the protective film (60) for correction and the correcting material (70) consists of a water-soluble material and the other consists of an oil-soluble material. @(19pp Dwg.No.1B,C/2)@.