发明名称 Method of making an aperture plate for a multibeam pattern drawing apparatus
摘要 For an aperture plate to be used to form dot images of a two dimensional aperture pattern by projection through an imaging optical system in a normal direction, a pattern of markings in ideal positions is projected through an imaging optical system in the reverse direction to normal imaging operations. The image of the pattern is recorded at the position of the aperture plate, and the recorded image is used as a guide to form corrected apertures in the aperture plate. Accordingly, locational errors of the dot images in the normal direction are corrected when the corrected aperture plate is used.
申请公布号 US5664251(A) 申请公布日期 1997.09.02
申请号 US19960648705 申请日期 1996.05.16
申请人 ASAHI KOGAKU KOGYO KABUSHIKI KAISHA 发明人 TACHIHARA, SATORU;MARUYAMA, KOICHI;NAKAMURA, TETSUYA;OKUYAMA, TAKASHI;MIYOSHI, TAMIHIRO;SUZUKI, SHINICHI
分类号 B43L13/00;B41J2/45;B41J3/407;B41J11/06;G03F1/08;G03F1/76;G03F7/20;(IPC1-7):G03B41/00;B41J2/447 主分类号 B43L13/00
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