| 摘要 |
<p>An exposure apparatus and an exposure method capable of performing high-precision superposition exposure by preventing the thermal deformation of a position measurement target, for controlling positioning of a moved member, from influencing the correction of an error in the positioning of the moved member. The exposure apparatus projects an image of a pattern, formed on a mask, onto a photosensitive substrate through a projection optical system. A stage, on which the photosensitive substrate is mounted, is movable in at least X-axis and Y-axis directions in an imaging plane of the projection optical system. Position measuring devices measure the position of the stage in each of the two directions and are disposed so that the Abbe error is substantially zero with respect to the position at which the substrate is exposed to the pattern image. A pattern detector is disposed on a measuring axis of the position measuring devices with respect to one of the two directions to optically detect an alignment pattern formed on the photosensitive substrate. A rotation measuring device measures the amount of rotation of a measurement target of the position measuring devices with respect to the X- and Y-axis directions, and a controller controls the position and the amount of rotation of the stage on the basis of the amount of rotation measured by the rotation measuring device, the positions measured by the position measuring devices, and information regarding the position of the pattern detected by the pattern detector.</p> |
