发明名称 MANUFACTURE OF THIN FILM TRANSISTOR
摘要 <p>PROBLEM TO BE SOLVED: To provide a thin film transistor in which a drain electrode part and a drain region can be electrically connected in a stable manner. SOLUTION: A semiconductor film 3 is formed, a gate insulating film 4 is formed thereon, and then the first contact hole is perforated on the gate insulating film 4 on a source region 6 and a drain region 7. The contact hole is covered by the first conductive material 8, an interlayer insulating film 9 is formed, and the second contact hole is perforated on the first conductive material 8 formed on the source region 6 and the drain region 7.</p>
申请公布号 JPH09219526(A) 申请公布日期 1997.08.19
申请号 JP19960024521 申请日期 1996.02.09
申请人 SEIKO EPSON CORP 发明人 HIRAIWA TAKU
分类号 G02F1/136;G02F1/1368;H01L21/336;H01L29/786;(IPC1-7):H01L29/786 主分类号 G02F1/136
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