发明名称 POSITIONING APPARATUS
摘要 <p>PROBLEM TO BE SOLVED: To achieve high precision positioning of a wafer with a notch in both angular directions of 0 degree and 90 degrees. SOLUTION: A fitting member 26 movable in the Y-axis direction and a fitting member 28 movable in the X-axis direction are provided, and two positioning pins are counterposed against each fitting member (one pin among those pins is used in common). Thus, when a substrate W is in a state where a notch thereof faces in the Y-axis direction as shown by a solid line, the positioning is performed by means of the fitting member 26 and the positioning pins 16, 18, and when the substrate W is in a state where the notch faces in the X-axis direction as shown by a virtual line, the positioning is performed by means of the fitting member 28 and the positioning pins 18, 20. Therefore, the wafer W with the notch can be positioned with high precision in both directions of 0 degree and 90 degrees.</p>
申请公布号 JPH09219437(A) 申请公布日期 1997.08.19
申请号 JP19960049510 申请日期 1996.02.13
申请人 NIKON CORP 发明人 AOYAMA MASAAKI
分类号 G03F9/00;H01L21/027;H01L21/68;(IPC1-7):H01L21/68 主分类号 G03F9/00
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