CONTINUOUS CVD EQUIPMENT FOR FILMS AND CONTINUOUS CVD PROCESS

摘要

Continuous CVD equipment for continuously and stably forming an extremely thin organic coating having special functions such as water repellency on a continuously running film; and a continuous CVD process therefor. This equipment comprises a vacuum chamber, a vacuum pump connected to the vacuum chamber, and a heatable tank which is filled with an organic compound that can be plasma-polymerized to form a film and in which the compound is vaporized; the vacuum chamber being equipped therein with a feed roll system for feeding a film continuously and a wind-up roll system for winding up a CVD film; a special running area for conducting the CVD of the film fed from the feed roll system and a plasma-generating area adjacent to that area being provided between the feed roll system and the wind-up roll system; and the tank being connected to the inside of the vacuum chamber by a pipe to thereby enable the feeding of the vapor of the compound generated in the tank into the plasma-generating area. The CVD process is one for continuously forming an organic compound coating on a continuously running film by the use of the above equipment.