发明名称 |
TFT with reduced channel length and method of making same |
摘要 |
A thin film transistor (TFT) having a reduced channel length and method of making same are disclosed for liquid crystal display (LCD) applications. The method of making the TFT includes the following process steps: (i) depositing and patterning the gate on a substrate; (ii) depositing and patterning an intrinsic a-Si layer, a n+ a-Si layer, and a source metal layer (e.g. Cr) over the gate; (iii) depositing and patterning an ITO layer to form a pixel electrode portion and a TFT source portion; (iv) etching the source metal layer so that it remains only under the ITO source portion so as to form the TFT source electrode; (v) depositing and patterning a metal (e.g. Mo) to form the drain of the TFT; and (vi) etching the n+ a-Si layer in the TFT channel area so that only the intrinsic semiconductor layer remains between the source and drain. The resulting TFT has a reduced channel length (e.g. less than about 4 mu m) less than the feature size of the lithography used so as to maximize ION/Cgs(ON) of the TFT. Maximizing ION/Cgs(ON) reduces pixel flickering, gray scale non-uniformity, and image retention in LCD applications.
|
申请公布号 |
US5656824(A) |
申请公布日期 |
1997.08.12 |
申请号 |
US19950532356 |
申请日期 |
1995.09.22 |
申请人 |
OIS OPTICAL IMAGING SYSTEMS, INC. |
发明人 |
DEN BOER, WILLEM;GU, TIEER |
分类号 |
H01L21/336;(IPC1-7):H01L27/01 |
主分类号 |
H01L21/336 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|