Positive working photosensitive composition

摘要

A positive working photosensitive composition comprising a resin having repeating units represented by the following formulae (I), (II) and (III), respectively and a compound which generates an acid with irradiation of an active ray or radiation: wherein R1 represents a hydrogen atom or a methyl group; R2 represents -C(=O)-O-C(R6)(R7)(R8) or -O-R5-C(=O)-O-C(R6)(R7)(R8); R3 represents -O-C(R6)(R7)(R8), -O-Si(R6)(R7)(R8) or -O-C(R9)(R10)-OR11; R4 represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an alkoxy group, an acyl group or an acyloxy group; R5 represents an alkylene group; R6, R7, R8, R9 and R10 each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group or an alkenyl group, provided that at least two among R6, R7 and R8 are groups other than a hydrogen atom; R11 represents an alkyl group or an aryl group; two groups selected from R6, R7 and R8 and two groups selected from R9, R10 and R11, each two groups may be combined to form a ring; and n is an integer from 1 to 3.