发明名称 CARRYING OF SUBSTRATE, SUBSTRATE CARRIER DEVICE AND TREATMENT SYSTEM
摘要 PROBLEM TO BE SOLVED: To improve throughput by realizing reduction in time in a carrier system in substrate treatment. SOLUTION: When a treated substrate P1 is to be housed in a cassette 42 and an untreated substrate P6 is to be taken out, a lower fork 26 of a carrier arm 21 supporting the substrate P6 is relatively lowered (in a direction of arrow G) with respect to the cassette 42, and at the same time, an upper fork 25 is relatively raised (in a direction of arrow F) with respect to the cassette 42 from below the substrate P6. The treated substrate P1 and the untreated substrate P6 may be simultaneously exchanged by the carrier arm 21, and the time in a carrier system may be reduced accordingly.
申请公布号 JPH09205127(A) 申请公布日期 1997.08.05
申请号 JP19960032927 申请日期 1996.01.26
申请人 TOKYO ELECTRON LTD 发明人 HIROKI TSUTOMU
分类号 G02F1/1333;B65G1/00;H01L21/677;H01L21/68;(IPC1-7):H01L21/68;G02F1/133 主分类号 G02F1/1333
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