发明名称 Photosensitive bis(halomethyloxadiazole) compound and photosensitive transfer sheet using the same
摘要 Photosensitive bis(halomethyloxadiazole) compounds which are capable of producing free radicals upon exposure to light represented by the following general formulae (1) to (4): <IMAGE> (1) <IMAGE> (2) <IMAGE> (3) <IMAGE> <IMAGE> (4) The symbols in the above formulae are defined in the present specification. The photosensitive bis(halomethyloxadiazole) compound is useful in the fields of recording materials such as photosensitive protecting films, printing plates, photoresists, proofs, etc. Furthermore, a photosensitive transfer sheet using a photosensitive composition containing the photosensitive bis(halomethyloxadiazole) is useful in making a prepress proof for color proofing, a color display, etc.
申请公布号 US5652082(A) 申请公布日期 1997.07.29
申请号 US19960703090 申请日期 1996.08.26
申请人 FUJI PHOTO FILM CO., LTD. 发明人 YUMOTO, MASATOSHI;YANAGIHARA, NAOTO;IWAKURA, KEN;FUJIMORI, JUNITI;FUJIMOTO, SHINJI;MAEDA, MINORU
分类号 C07D271/10;G03F7/029;(IPC1-7):F23Q1/02 主分类号 C07D271/10
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