发明名称 Method for forming single crystal layer
摘要 <p>A crystal forming method comprises disposing, on a surface of a substrate or in recessed portion formed in the substrate having a surface with a low nucleation density, primary seed having a sufficient small volume to singly aggregate and a rectangular prismatic or cubic shape in which all the sides and the bottom are surrounded by an insulator in contact therewith; performing heat treatment for aggregating the primary seed to form monocrystalline seed crystal having controlled plane orientation and in-plane orientation; and selectively growing monocrystal by crystal growth treatment using the seed crystal as starting point.</p>
申请公布号 EP0486019(B1) 申请公布日期 1997.07.23
申请号 EP19910119447 申请日期 1991.11.14
申请人 CANON KABUSHIKI KAISHA 发明人 YAMAGATA, KENJI
分类号 C30B25/18;H01L21/20;(IPC1-7):C30B25/18 主分类号 C30B25/18
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