| 摘要 |
PURPOSE:To decrease the generation of a incomplete erasing by forming the metallic film on guiding grooves of a substrate on which a magnetic film and the metallic film are provided to the film thickness larger than the film thickness of the metallic film on the flat lands between the guiding grooves. CONSTITUTION:The guiding grooves (grooves) 7 each having a U shape are formed on the substrate 1. An SiN film 2 is formed on the substrate 1 and a magnetic Tb-Fe-Co-Nb film 3 is formed thereon. A metallic Al-Si film 4 is then formed thereon and is subjected to sputter etching, by which the Al-Si film 4 on the grooves is formed thicker than the Al-Si film 4 on the flat lands 6 between the grooves 7. An SiN film 5 is formed upon after the sputter etching. Recording is made only in the magnetic domains of the land parts 6 even if off-tracking is generated by a degradation of the recording sensitivity of the magnetic films 3 on the grooves 7 in such a manner. The generation of the incomplete erasing is, therefore, decreased. |
