| 摘要 |
A photosensitive composition which comprises, as essential components: (A) a polymer having carboxyl group(s) and hydroxyphenyl group(s), or (A') a polymer having carboxy group(s) and (A'') a polymer having hydroxyphenyl group(s), (B) a compound having at least two vinyl ether groups in the molecule, and (C) a compound which generates an acid when irradiated with am actinic ray, and which is useful as a positive type photoresist having high resolution and excellent formability of fine image pattern, a material for printing, etc.; and a process for pattern formation using said composition.
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