发明名称 |
ORGANIC METAL VAPOR PHASE GROWING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a vapor phase growing method for growing carbon-doped GaAs or AlGaAs as halomethane or carbon hydride halide as dopant on the AlGaAs or AlAs. SOLUTION: With halomethane (CBr4 ) or carbon hydride halide as dopant, carbon-doped GaAs or AlGaAs is grown on AlGaAs or AlAS by delaying the time point of starting to supply halomethane (CBr4 ) or carbon hydride halide from the time point of starting to supply an Al source and a Ga source to the time point of growing nondoped GaAs or AlGaAs to 0.5 to 2nm. |
申请公布号 |
JPH09186094(A) |
申请公布日期 |
1997.07.15 |
申请号 |
JP19960000002 |
申请日期 |
1996.01.04 |
申请人 |
FURUKAWA ELECTRIC CO LTD:THE |
发明人 |
IKEDA MASAKIYO;NAKAI AKINOBU;ITO MITSUMASA |
分类号 |
C23C16/52;H01L21/205;H01L33/30 |
主分类号 |
C23C16/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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