发明名称 ORGANIC METAL VAPOR PHASE GROWING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a vapor phase growing method for growing carbon-doped GaAs or AlGaAs as halomethane or carbon hydride halide as dopant on the AlGaAs or AlAs. SOLUTION: With halomethane (CBr4 ) or carbon hydride halide as dopant, carbon-doped GaAs or AlGaAs is grown on AlGaAs or AlAS by delaying the time point of starting to supply halomethane (CBr4 ) or carbon hydride halide from the time point of starting to supply an Al source and a Ga source to the time point of growing nondoped GaAs or AlGaAs to 0.5 to 2nm.
申请公布号 JPH09186094(A) 申请公布日期 1997.07.15
申请号 JP19960000002 申请日期 1996.01.04
申请人 FURUKAWA ELECTRIC CO LTD:THE 发明人 IKEDA MASAKIYO;NAKAI AKINOBU;ITO MITSUMASA
分类号 C23C16/52;H01L21/205;H01L33/30 主分类号 C23C16/52
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