发明名称 HARD DISC BASE POLISHING COMPOSITION
摘要 PROBLEM TO BE SOLVED: To obtain the polished surface with very few scratches and micro protrusions by dispersing abrasive grains in a water medium containing water soluble resin and acetylene alcohol or its derivative to form a polishing composition. SOLUTION: Abrasive grains are dispersed in a water medium containing water soluble resin and acetylene alcohol or its derivative to form a polishing composition. The acetylene alcohol and its derivative therefore attain excellent defoaming effect with a small quantity without having adverse effect on the dispersibility of abrasive grains and can easily removed from a base. While feeding this polishing composition to abrasive cloth, this abrasive cloth is brought into contact with the Ni-P plating of a hard disc base, rotated at about 50-300rpm, to perform polishing.
申请公布号 JPH09168966(A) 申请公布日期 1997.06.30
申请号 JP19950330197 申请日期 1995.12.19
申请人 MITSUBISHI CHEM CORP 发明人 KAWASHIMA MASAHIRO;HASHIMOTO KIICHI;CHINO MIYUKI
分类号 B24B37/00;C09K3/14;G11B5/84 主分类号 B24B37/00
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