| 摘要 |
An article of manufacture is provided both for coordinating multiple fiels of view of a plurality of cameras (18, 20, 22) so as to facilitate determining the distance between features on a semiconductor wafer, each feature being disposed within a different field of view, and for correcting image distortion within each field of view. The article of the invention includes a substantially rigid dimensionally-stable substrate (10), such as a plate, having a plurality of image distorsion calibration targets (12, 14, 16) that are each located at a known relative position. In a preferred embodiment, each calibration target is disposed at an orientation angle such that a first principle axis of the calibration target is perpendicular to a tangent to the perimeter of the semiconductor wafer. In the embodiment, the substrate includes physical alignment features that facilitate coordination of the multi-camera coordinate system of the article of the invention with the coordinate system of a semiconductor manufacturing machine.
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