Thermographic material with outermost organic antistatic layer

摘要

A (photo)thermographic recording material comprising a (photo-addressable) thermosensitive element, a support and an outermost antistatic layer, the thermosensitive element comprising a substantially light-insensitive organic silver salt, an organic reducing agent for the substantially light-insensitive organic silver salt in thermal working relationship therewith and a binder, characterized in that the outermost antistatic layer is an organic layer with a resistivity of < 10<10> OMEGA / &squ& at a relative humidity of 30%. The outermost antistatic layer may comprise a polythiophene with conjugated polymer backbone in the presence of a polymeric polyanion compound and a hydrophobic organic polymer having a glass transition value (Tg) of at least 40 DEG C, the polythiophene being present at a coverage of at least 0.001g/m<2> and the weight ratio of the polythiophene to the hydrophobic organic polymer being in the range of 1/10 to 1/1000. A production process for the thermographic recording material and a thermographic recording process therefor are also provided.