发明名称 CONTACT MASK
摘要 PROBLEM TO BE SOLVED: To provide a contact mask which forms a prescribed pattern on a working face without being influenced by debris. SOLUTION: A reflecting film 8 is formed on the lower face of a transparent member 7 leaving a transparent part 9 functioning optically as a slit, with a laser beam passing through this transparent part 9, a groove with a shape as same as the transparent part 9 is formed on a working face 11, further a leg part 10 is installed on the down face of the transparent member 7 and debris caused from the working face 11 following to working the groove is removed excellently.
申请公布号 JPH09155580(A) 申请公布日期 1997.06.17
申请号 JP19950317801 申请日期 1995.12.06
申请人 MITSUBISHI HEAVY IND LTD 发明人 HAMADA SHOICHI;AKAHA TAKASHI;ISHIDE TAKASHI
分类号 G02B5/20;B23K26/00;B23K26/06;B23K26/14;B29D11/00 主分类号 G02B5/20
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