发明名称 IC fault analysis system having charged particle beam tester
摘要 An IC fault analysis system which is capable of accurately correlating mask layout data and/or net listing data associated with CAD (computer aided design) data developed in the IC design and an image obtained by a non-contact type tester such as an electron beam tester. The IC fault analysis system includes a circuit diagram display for showing a circuit diagram of the IC device under test based on the CAD data, a mask layout display for showing a mask layout of the IC device under test based on the CAD data, a contrast image display for showing a potential distribution of the IC device under test obtained in the non-contact type tester, an input means connected to the circuit diagram display for specifying a circuit component of the IC device under test, a comparison means for comparing the circuit diagram of the circuit component defined by the input means and contrast image corresponding to the circuit component, and a comparison data memory for storing the comparison data of the comparison means and providing the comparison data to the contrast image display.
申请公布号 US5640098(A) 申请公布日期 1997.06.17
申请号 US19960593549 申请日期 1996.01.30
申请人 ADVANTEST CORPORATION 发明人 NIIJIMA, HIRONOBU;KAWAMOTO, HIROSHI;GOISHI, AKIRA;KURIHARA, MASAYUKI;IWAI, TOSHIMICHI
分类号 G01R31/307;G01R31/319;(IPC1-7):G01R31/305 主分类号 G01R31/307
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