| 摘要 |
An electron-beam gun system is provided having a cathode arrangement and a grid electrode. The cathode arrangement is a high-current cathode (22) having an emitting surface (23). The grid electrode includes a hat-shaped grid 1-electrode (24) located at a distance of 30 to 80 mu m from the emitting surface (23) of the high-current cathode (22), which has a width in a range of 30 to 70 mu m in a passing area (18.2) for electrons. The grid electrode includes a grid 2-electrode (15) that is at least 250 mu m wide in a passing area (18) for the electrons, and includes a grid 3-electrode (14) having an inlet side that is 250 to 400 mu m wide in a passing area (18.1) for the electrons.
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