发明名称 METHOD FOR EXPOSING MASTER OPTICAL DISK AND DEVICE THEREFOR AND OPTICAL DISK
摘要 PROBLEM TO BE SOLVED: To position an exposure point with high accuracy without lowering throughput at the time of exposure. SOLUTION: The progressing direction of an electron beam 22 emitted from an electron gun 21 is controlled according to the position of the pit signals formed on an optical master disk 2. The electron beam 22 after the control of the progressing direction is converted to fluorescence 26. This fluorescence 26 is condensed by a microlens array 27 and the optical master disk 2 is exposed by this light.
申请公布号 JPH09147427(A) 申请公布日期 1997.06.06
申请号 JP19950299938 申请日期 1995.11.17
申请人 TOSHIBA CORP 发明人 KANENAWA KATSUYUKI
分类号 G11B11/10;G11B7/135;G11B7/26;G11B11/105 主分类号 G11B11/10
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