发明名称 |
Ultra-low particle semiconductor method |
摘要 |
A method operates a system for wet processing of semiconductors. The system includes an inlet coupled to a fluid source, and a filter coupled to the inlet. The system also includes a sealed vessel coupled to the filter where the sealed vessel has a lower liquid portion and an upper vapor portion. The system further includes an outlet coupled to the sealed vessel. The outlet is attached to the lower liquid portion. A solvent injector coupled to the sealed vessel is also used. The solvent injector is coupled to the upper vapor portion, and supplies a gaseous mixture including a polar organic compound. The polar organic compound is a non-saturated polar organic vapor. The system also includes a gas source coupled to the sealed vessel. The gas source is coupled to the upper vapor portion, and supplies an inert gas into the upper vapor portion. A device for removing the liquid from the lower liquid portion at substantially a constant liquid level rate is also included.
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申请公布号 |
US5634978(A) |
申请公布日期 |
1997.06.03 |
申请号 |
US19940339326 |
申请日期 |
1994.11.14 |
申请人 |
YIELDUP INTERNATIONAL |
发明人 |
MOHINDRA, RAJ;BHUSHAN, ABHAY;BHUSHAN, RAJIV;PURI, SURAJ;ANDERSON, SR., JOHN H.;NOWELL, JEFFREY |
分类号 |
B08B3/10;G11B23/50;H01L21/00;H01L21/306;(IPC1-7):B08B3/08;B08B11/00 |
主分类号 |
B08B3/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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