发明名称 |
REMOVING METHOD FOR FILM OF RESIN BASE SURFACE |
摘要 |
<p>PROBLEM TO BE SOLVED: To make it possible to form recyclable reclaimed resin by sufficiently removing the film formed on the resin base surface of a resin product without lowering resin physical properties. SOLUTION: The method for removing the film of resin base surface comprises the steps of introducing resin base having the film on the surface in a reaction vessel having an agitator, agitating it at 1.8m/sec of the rotating speed at the end of the agitating blade of the agitator at a lower temperature than the melting temperature of the base at 110 deg.C or lower in the presence of aqueous release liquid of the quantity for forming the same as or lower than the uppermost surface of the base laminated in the vessel, and bringing the surfaces of the bases into contact with each other to polish it.</p> |
申请公布号 |
JPH09141657(A) |
申请公布日期 |
1997.06.03 |
申请号 |
JP19950303034 |
申请日期 |
1995.11.21 |
申请人 |
MITSUI PETROCHEM IND LTD |
发明人 |
FURUTA SHUNSUI;HAYASHI MASANORI;SAITO MITSUO |
分类号 |
C08J11/16;B29B17/00;(IPC1-7):B29B17/00 |
主分类号 |
C08J11/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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