Verfahren zum Herstellen einer Halbleiteranordnung, wobei ein selbstregistrierendes Kobalt- oder Nickelsilizid gebildet wird,申请号DE1992615926T-传众专利搜索

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发明名称	Verfahren zum Herstellen einer Halbleiteranordnung, wobei ein selbstregistrierendes Kobalt- oder Nickelsilizid gebildet wird
摘要
申请公布号	DE69215926(T2)	申请公布日期	1997.05.28
申请号	DE1992615926T	申请日期	1992.02.18
申请人	PHILIPS ELECTRONICS N.V., EINDHOVEN, NL	发明人	DUCHATEAU, JOHAN PHILIPPE WILLIAM, NL-5656 AA EINDHOVEN, NL;READER, ALEC HAROLD, NL-5656 AA EINDHOVEN, NL;VAN DER KOLK, GERRIT JAN, NL-5656 AA EINDHOVEN, NL
分类号	H01L21/28;H01L21/285;H01L21/336;H01L21/60;H01L21/768;H01L29/78;(IPC1-7):H01L21/285;H01L21/320	主分类号	H01L21/28
代理机构		代理人
主权项
地址

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