发明名称 Herstellungsverfahren von magnetoresistiven Sensoren und nach diesem Verfahren hergestellte magnetische Vorrichtung
摘要 The invention relates to a method of fabricating a plurality of magnetoresistive sensors (M1 to Mn) on the same substrate (11). The particular object of the invention is to facilitate a polishing phase. The method of the invention consists in depositing a layer of a magnetoresistive material on a substrate (11), and in then producing a plurality of magnetoresistive elements (CM1 to CMn) in this layer. According to one characteristic of the invention, the method consists in producing, at the site of each sensor (M1 to M5) and before depositing the magnetoresistive layer, a sloping surface (15), such that each magnetoresistive element (CM1 to CM2) is formed on such a sloping surface (15) and has an edge (8) pointing outwards from the substrate. <IMAGE>
申请公布号 DE69124685(T2) 申请公布日期 1997.05.28
申请号 DE1991624685T 申请日期 1991.12.17
申请人 THOMSON-CSF, PARIS, FR 发明人 PIROT, FRANCOIS-XAVIER, F-92045 PARIS LA DEFENSE, FR;COUTELLIER, JEAN-MARC, F-92045 PARIS LA DEFENSE, FR;VALET, THIERRY, F-92045 PARIS LA DEFENSE, FR
分类号 G11B5/31;G11B5/39;H01L43/08;(IPC1-7):G11B5/39 主分类号 G11B5/31
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