发明名称 |
THIN FILM CAPACITOR AND SEMICONDUCTOR STORAGE DEVICE UTILIZING THE CAPACITOR |
摘要 |
PROBLEM TO BE SOLVED: To provide a thin film capacitor which assures small leak current and high dielectric constant and also provide a semiconductor storage device having a small area and large capacity thin film capacitor. SOLUTION: In a thin film capacitor holding a dielectric material film 243 having the perovskite composition, an electric conductive oxide of the perovskite structure expressed by ABO3 is used as an electrode material of this capacitor. Here, the A site structure elements are at least two kinds selected from alkali earth metal and rare metal, while the B site structure element is at least a kind selected from transition metals. A barrier height of interface lattice matching may be optimized by selecting kind of each structural element and its composition of ABO3 . |
申请公布号 |
JPH09139480(A) |
申请公布日期 |
1997.05.27 |
申请号 |
JP19960011429 |
申请日期 |
1996.01.26 |
申请人 |
TOSHIBA CORP |
发明人 |
FUKUSHIMA SHIN;KAWAKUBO TAKASHI;SHIMIZU TATSUO |
分类号 |
C30B29/22;H01G4/33;H01L21/02;H01L21/822;H01L21/8242;H01L21/8246;H01L27/04;H01L27/105;H01L27/108;H01L27/115;H01L27/12 |
主分类号 |
C30B29/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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