发明名称 THIN FILM CAPACITOR AND SEMICONDUCTOR STORAGE DEVICE UTILIZING THE CAPACITOR
摘要 PROBLEM TO BE SOLVED: To provide a thin film capacitor which assures small leak current and high dielectric constant and also provide a semiconductor storage device having a small area and large capacity thin film capacitor. SOLUTION: In a thin film capacitor holding a dielectric material film 243 having the perovskite composition, an electric conductive oxide of the perovskite structure expressed by ABO3 is used as an electrode material of this capacitor. Here, the A site structure elements are at least two kinds selected from alkali earth metal and rare metal, while the B site structure element is at least a kind selected from transition metals. A barrier height of interface lattice matching may be optimized by selecting kind of each structural element and its composition of ABO3 .
申请公布号 JPH09139480(A) 申请公布日期 1997.05.27
申请号 JP19960011429 申请日期 1996.01.26
申请人 TOSHIBA CORP 发明人 FUKUSHIMA SHIN;KAWAKUBO TAKASHI;SHIMIZU TATSUO
分类号 C30B29/22;H01G4/33;H01L21/02;H01L21/822;H01L21/8242;H01L21/8246;H01L27/04;H01L27/105;H01L27/108;H01L27/115;H01L27/12 主分类号 C30B29/22
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