发明名称 Method of making combined JFET & MOS transistor device
摘要 A transistor circuit is formed on a substrate having source and drain electrodes and multiple current-controlling gates. The two current-controlling gates are separated by spacer oxide material. The first gate is an metal oxide semiconductor (MOS) gate that is insulated from the substrate by a layer of gate oxide. The second gate is a junction field effect transistor (JFET) gate contiguous to the MOS gate that is insulated from the MOS gate by a layer of spacer oxide.
申请公布号 US5631176(A) 申请公布日期 1997.05.20
申请号 US19960612337 申请日期 1996.03.06
申请人 LSI LOGIC CORPORATION 发明人 KAPOOR, ASHOK K.
分类号 H01L21/28;H01L21/336;H01L29/78;(IPC1-7):H01L21/265 主分类号 H01L21/28
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