发明名称 |
Method of making combined JFET & MOS transistor device |
摘要 |
A transistor circuit is formed on a substrate having source and drain electrodes and multiple current-controlling gates. The two current-controlling gates are separated by spacer oxide material. The first gate is an metal oxide semiconductor (MOS) gate that is insulated from the substrate by a layer of gate oxide. The second gate is a junction field effect transistor (JFET) gate contiguous to the MOS gate that is insulated from the MOS gate by a layer of spacer oxide.
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申请公布号 |
US5631176(A) |
申请公布日期 |
1997.05.20 |
申请号 |
US19960612337 |
申请日期 |
1996.03.06 |
申请人 |
LSI LOGIC CORPORATION |
发明人 |
KAPOOR, ASHOK K. |
分类号 |
H01L21/28;H01L21/336;H01L29/78;(IPC1-7):H01L21/265 |
主分类号 |
H01L21/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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