| 摘要 |
PROBLEM TO BE SOLVED: To obtain a large-scale integrated circuit by using a polarity-variable photosensitive resin compsn. which can be developed with a water-based solvent by incorporating a specified carboxylate polymer and a photo-base producing agent which produces a base by irradiation of electromagnetic waves. SOLUTION: The means to form a circuit or a protective film of a large-scale integrated circuit includes the following processes. A process to apply a photosensitive resin compsn. described below on a substrate and to dry the resin. A process to irradiate the resin with electromagnetic waves through a light- shielding mask and to develop the resin. The photosensitive resin compsn. used contains a carboxylate polymer expressed by formula having the mol.wt. between >=10000 and <=1000000 by >=20wt.% of the whole resin amt., and to the ester groups of the carboxylate polymer, 0.01-0.5mol.equiv. photo-base producing agent which produces a base by irradiation of electromagnetic waves. In formula, R1 is 2-40C org. group, n is an integer 10 to 20000, R2 is 1-20C org. group, hydrogen atom or halogen atom, and R3 is 1-30C org. group. |
