发明名称 METHOD AND DEVICE FOR MONITORING AND POSITIONING PROCESSING BEAM FOR MATERIAL TO BE PROCESSED OR JET STREAM
摘要 PROBLEM TO BE SOLVED: To provide a method and device capable of performing continuous monitoring and positioning of beam or jet flow, especially laser beam, and also correction to the basic position, easily and inexpensively. SOLUTION: Comparison is made between the preset value or the value or the detection result obtained from a first sensor 7 relating to the prescribed position of beam or jet flow and the value or the detection result obtained from a second sensor 9 relating the actual position of beam or jet flow 3. The comparison should be made in consideration of relative displacement depending on the speed of beam or jet flow to a workpiece, and in the case where there is difference between the actual position and the prescribed position, beam or jet flow 3 is corrected at the basic position.
申请公布号 JPH09126726(A) 申请公布日期 1997.05.16
申请号 JP19960262077 申请日期 1996.10.02
申请人 ELPATRONIC AG 发明人 NORUBERUTO GUROOSU;HAINTSU PEE HERUMU
分类号 G01B11/00;B23K9/127;B23K15/02;B23K26/044 主分类号 G01B11/00
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