发明名称 Semiconductor device with improved insulating/passivating layer
摘要 <p>A semiconductor device with improved insulating and passivating layer comprises: a GaAs substrate; a semiconductor device formed on the surface of the substrate; an insulating and passivating layer of InGaF positioned on at least portions of the device and crystallographically lattice matched to the substrate.</p>
申请公布号 EP0773579(A2) 申请公布日期 1997.05.14
申请号 EP19960117872 申请日期 1996.11.12
申请人 MOTOROLA, INC. 发明人 ABROKWAH, JONATHAN K.;THOMPSON, DANNY L.;WANG, ZHIGUO
分类号 H01L29/78;H01L21/28;H01L21/314;H01L21/336;H01L23/29;H01L29/24;H01L29/51;H01L29/80;(IPC1-7):H01L21/28;H01L21/335 主分类号 H01L29/78
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