发明名称 |
Method of forming semiconductor memory device by selectively forming an insulating film on the drain region |
摘要 |
A semiconductor memory device capable of being electrically written and erased comprising a floating gate, wherein, a silicon nitride film is incorporated between the drain region and the floating gate. Also claimed is a method for forming the same, which comprises forming a drain region on selected portions of a semiconductor substrate; forming a silicon nitride film or a silicon oxinitride film or a silicon carbide film or an aluminum oxide film selectively on the drain region; coating the substrate with a gate oxide film; and establishing a floating gate and thereafter a control gate.
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申请公布号 |
US5629222(A) |
申请公布日期 |
1997.05.13 |
申请号 |
US19950430833 |
申请日期 |
1995.04.28 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
YAMAZAKI, SHUNPEI;TAKEMURA, YASUHIKO |
分类号 |
H01L29/423;H01L29/788;(IPC1-7):H01L21/824 |
主分类号 |
H01L29/423 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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