发明名称 SUBSTRATES FOR THE GROWTH OF 3C-SILICON CARBIDE.
摘要 A substrate for the growth of monocrystalline beta -SiC is formed by providing a body of monocrystalline hexagonal material having a planar surface with a lattice parameter that is within +/-5% of the lattice parameter of 6H alpha -SiC in the basal plane and growing a body of monocrystalline cubic material on the surface to provide a planar cubic material surface that is without grain boundaries, subgrain boundaries, double positioning boundaries, and pits. The cubic material, for example TiC, ZrC, HfC, or TiN, has a rock salt structure and a lattice parameter within +/-5% of the lattice parameter of beta -SiC. Monocrystalline beta -SiC can be nucleated and grown on the surface of the cubic material.
申请公布号 EP0672298(A4) 申请公布日期 1997.05.07
申请号 EP19940903525 申请日期 1993.12.07
申请人 OREGON GRADUATE INSTITUTE OF SCIENCE AND TECHNOLOGY 发明人 PARSONS, JAMES, D.;CHADDA, AJAY, K.;CHEN, HER, SONG;WU, JIN
分类号 H01L21/205;C30B25/02;H01L21/20 主分类号 H01L21/205
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