发明名称 Durchlauf-Galvanikanlage
摘要 The invention concerns an electroplating plant comprising an electroplating container and a supply container between which the electrolyte circulates. In the supply container the metal content of the electrolyte is supplemented by a soluble anode which is associated with an auxiliary cathode located in an auxiliary catholyte which is separated from the electrolyte by a diaphragm which is impermeable to metallic ions. The insoluble anodes of the electroplating container are located in an auxiliary anolyte separated from the electrolyte by diaphragms which are impermeable to anions. The essential advantage of the invention is that insoluble anodes and necessary organic additives for the production of precision coatings, for example in the field of printed circuit boards, can also be used. According to a particularly advantageous development, the auxiliary catholyte and the auxiliary anolyte are guided in a common circuit such that opposed shifts in the pH value of the auxiliary catholyte and auxiliary anolyte are largely compensated as a result of their being continually mixed.
申请公布号 DE19539865(A1) 申请公布日期 1997.04.30
申请号 DE19951039865 申请日期 1995.10.26
申请人 LEA RONAL GMBH, 75217 BIRKENFELD, DE 发明人 FUCHS, KARL HANS, 71254 DITZINGEN, DE
分类号 C25D17/00;C25D21/14;H05K3/24;(IPC1-7):C25D21/18;C25D21/00;C25D21/22;C25D5/18 主分类号 C25D17/00
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