发明名称 Apparatus for film coating a substrate
摘要 Apparatus for film coating a substrate (2), with two cathodes (30,31) each connected to one pole of an alternating current source (15) and each in a separate compartment (4,12) forming a single vacuum chamber (3) together with a number of adjacent compartments (4 to 12') connected by a through-passage (32). The two compartments (4,12) with cathodes (30,31) connected to the current source (15) are separated by several compartments (5 to 11 and 5' to 10') at least partly equipped with an additional sputter cathode (33 to 38) each with separate current supply.
申请公布号 DE19540255(A1) 申请公布日期 1997.04.30
申请号 DE19951040255 申请日期 1995.10.28
申请人 BALZERS UND LEYBOLD DEUTSCHLAND HOLDING AG, 63450 HANAU, DE 发明人 SZCZYRBOWSKI, JOACHIM, DR., 63773 GOLDBACH, DE;TESCHNER, GOETZ, 63571 GELNHAUSEN, DE
分类号 C23C14/56;H01J37/34;(IPC1-7):H01J37/32;H05H1/46;C23C14/22 主分类号 C23C14/56
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