| 摘要 |
FIELD: glass working. SUBSTANCE: etching liquid has the following composition, wt.-%: hydrofluoric acid, 50-60; polyacrylamide, 2-3; nitric acid, 13-16; hydrochloric acid, 12-16; and selenic acid, 12-16. Use of composition increases the rate of glass etching. EFFECT: decreased working time. |
