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发明名称
Strahlungsempfindliches Gemisch und Verfahren zur Herstellung von Reliefstrukturen
摘要
申请公布号
DE59010681(D1)
申请公布日期
1997.04.24
申请号
DE19905010681
申请日期
1990.12.01
申请人
BASF AG, 67063 LUDWIGSHAFEN, DE
发明人
NGUYEN KIM, SON, DR., W-6944 HEMSBACH, DE
分类号
G03F7/039;(IPC1-7):G03F7/039
主分类号
G03F7/039
代理机构
代理人
主权项
地址
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