MANUFACTURE OF HALFTONE PHASE INVERSION MASK

摘要

PROBLEM TO BE SOLVED: To facilitate the addition of chrome border function as well as enhance the ratio of yield and reliability. SOLUTION: This method comprises the steps of: forming a shifter 13(33) on the whole surface of a transparent substrate; forming a light shielding film 15(35) on the whole surface of the shifter 13(33); forming a photoregister 17(37) on the whole surface of a light shielding film 15(35); forming a photoregistration pattern 17a(37a) by patterning photoregistration to thereby expose the light shielding film; forming a light shielding pattern 15a(35a) by etching the light shielding film exposed by using the registration pattern as the etching mask to thereby expose the shifter; removing the photregistration pattern and performing cleaning; forming a shifter pattern by etching the exposed shifter by using the light shielding film pattern as the etching mask; and removing the light shielding pattern. Accordingly no defect is generated in a phase inverted mask.