发明名称 Electrophotographic method with residual charge elimination
摘要 The electrophotographic process of this invention is characterized in that a single layer organic photosensitive material having an absorbance, at a maximum absorption wavelength of a visible portion per mu m of the thickness of a photosensitive layer, of at least 0.05 is used, and for its charge elimination, a light-emitting diode light which emits a light of a maximum absorption wavelength or a light in its vicinity is irradiated. According to this process, when image formation carried out repeatedly a number of times, a decrease in an early period surface potential can be effectively prevented and a brilliant image can be formed in a high concentration.
申请公布号 US5622798(A) 申请公布日期 1997.04.22
申请号 US19950542061 申请日期 1995.10.12
申请人 MITA INDUSTRIAL CO., LTD. 发明人 KIMOTO, KEIZO
分类号 G03G5/04;G03G5/06;G03G21/08;(IPC1-7):G03G21/08 主分类号 G03G5/04
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