发明名称 |
Plasma CVD method for producing a diamond coating |
摘要 |
The invention relates to a method for depositing a diamond coating on a workpiece, for instance a drawing die or a tool punch, whereby a reactive plasma supported coating method is used. According to the invention the generation of the plasma is made by a direct current discharge, whereby additionally a flow of charged particles is fed into the discharge gap; according to the invention the workpiece to be coated is positioned in the discharge gap. Due to the inventive design a relatively long discharge gap can be used, such that also large surface areas can be coated; the coating is made at a location of the highest homogeneity and density of the plasma. By means of the invention a method is provided which can be controlled regarding financial expenses and in a reliable manner and which is suitable for large surface area coating.
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申请公布号 |
US5616373(A) |
申请公布日期 |
1997.04.01 |
申请号 |
US19940215965 |
申请日期 |
1994.03.18 |
申请人 |
BALZERS AKTIENGESELLSCHAFT |
发明人 |
KARNER, JOHANN;BERGMANN, ERICH;DAXINGER, HELMUT |
分类号 |
C23C16/26;C23C16/27;C23C16/44;C23C16/455;C23C16/50;C23C16/503;C30B29/04;H01J37/32;(IPC1-7):B05D3/06 |
主分类号 |
C23C16/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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