发明名称 |
Compounds useful as chemical precursors in chemical vapor deposition of silicon-based ceramic materials |
摘要 |
In order to reduce the rate of coke formation during the industrial pyrolysis of hydrocarbons, the interior surface of a reactor is coated with a thin layer of a ceramic material, the layer being deposited by thermal decomposition of a non-oxygen containing silicon-nitrogen precursor in the vapor phase, tin an inert or reducing gas atmosphere in order to minimize the formation of oxide ceramics.
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申请公布号 |
US5616754(A) |
申请公布日期 |
1997.04.01 |
申请号 |
US19950378574 |
申请日期 |
1995.01.26 |
申请人 |
ENICHEM S.P.A. |
发明人 |
CRUSE, RICHARD;SZALAI, VERONIKA;CLARK, TERENCE;ROHMAN, STEPHEN;MININNI, ROBERT |
分类号 |
C07F7/21;C10B43/14;C10G9/16;C23C16/32;C23C16/34;C23C16/36;(IPC1-7):C07P7/08;C07F7/10 |
主分类号 |
C07F7/21 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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