发明名称 Compounds useful as chemical precursors in chemical vapor deposition of silicon-based ceramic materials
摘要 In order to reduce the rate of coke formation during the industrial pyrolysis of hydrocarbons, the interior surface of a reactor is coated with a thin layer of a ceramic material, the layer being deposited by thermal decomposition of a non-oxygen containing silicon-nitrogen precursor in the vapor phase, tin an inert or reducing gas atmosphere in order to minimize the formation of oxide ceramics.
申请公布号 US5616754(A) 申请公布日期 1997.04.01
申请号 US19950378574 申请日期 1995.01.26
申请人 ENICHEM S.P.A. 发明人 CRUSE, RICHARD;SZALAI, VERONIKA;CLARK, TERENCE;ROHMAN, STEPHEN;MININNI, ROBERT
分类号 C07F7/21;C10B43/14;C10G9/16;C23C16/32;C23C16/34;C23C16/36;(IPC1-7):C07P7/08;C07F7/10 主分类号 C07F7/21
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