POLYSILOXANE COMPOUND AND POSITIVE RESIST MATERIAL

摘要

PROBLEM TO BE SOLVED: To obtain a polysiloxane compd. which is usable for a bilayer resist method and useful as the main polymer of a positive resist material suitable for fine processing techniques by selecting a specific polysiloxane compd. SOLUTION: This polysiloxane compd. is represented by formula I [wherein R is a group represented by formula II (wherein R<1> and R<2> are each H or a 1-6C linear or branched alkyl group; and R<3> is a 1-6C linear or branched alkyl group) or formula III (wherein R<4> is H or methyl); Q is an acid-instable group; x+y+z=1 provided x and y are each not 0; and n is 1-3] and is used as an alkali-sol. polymer to obtain a positive resist material. The resist material may be a two-component system contg., in addition to the compd., an acid generator or may be a three-component system further contg. a dissolution inhibitor. An onium salt represented by the formula: (R)p JW [wherein R is an optionally substd. arom. group; J is sulfonium or iodonium; M is an optionally substd. alkyl group or an arylsulfonate group; and (p) is 2 or 3] is pref. used as the acid generator.