ACTIVE MATRIX SUBSTRATE AND ITS MANUFACTURE

摘要

PROBLEM TO BE SOLVED: To prevent incident light to an active matrix substrate and reflection light caused by a lens, etc., used for an optical system from arriving at a thin film transistor by forming a first light shielding film and a second light shielding film shielding the light irradiating the thin film transistor on the upside and the downside of the thin film transistor. SOLUTION: In the active matrix substrate, the thin film transistors 2 is formed on a transparent insulated substrate 1 provided with a scanning line and a signal line. Then, the first light shielding film 7 formed on the thin film transistor 2 and shielding the light irradiating the thin film transistor 2 and the second light shielding film 11 formed on the position opposite to the first light shielding film 7 holding the transparent insulated substrate 1 in-between on the rear side surface of the transparent insulated substrate 1 and shielding the light irradiating the thin film transistor 2 are provided. Then, the part where the second light shielding film 11 is formed on the rear side surface of the transparent insulated substrate 1 is made a coarse surface 9.