发明名称 COLOR FILTER RESIST FOR BLACK MATRIX
摘要 PROBLEM TO BE SOLVED: To obtain a resist at low production cost, excellent in light shielding property and also image forming property and the dispersibility of coloring material by containing a specific carbon black as the coloring material. SOLUTION: This resist contains the carbon black having 50-200nm average particle diameter and 10-40ml/100g of DBP oil absorption. The carbon black shows preferably pH5-8 on the surface. Further an ethylenic unsaturated compound having a substituent group expressed by formulas I or II is preferably contained. In the formulas, (m) expresses 0 or integer of 1-5. Each of R<1> and R<2> expresses hydrogen atom or a halogen atom. R<3> expresses a 1-10C (may be substituted) alkylene group. R<4> expresses hydrogen atom, a 1-10 alkyl group, which can have a hydroxide group, or a 6-15C aryl group. R<5> expresses hydrogen atom or methyl group.
申请公布号 JPH0980220(A) 申请公布日期 1997.03.28
申请号 JP19950235135 申请日期 1995.09.13
申请人 MITSUBISHI CHEM CORP 发明人 URANO TOSHIYOSHI;IKEDA SHINGO;HINO ETSUKO
分类号 G03F7/004;G02B5/20;G02F1/1335 主分类号 G03F7/004
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