| 摘要 |
PROBLEM TO BE SOLVED: To obtain a photosensitive compsn. having satisfactory dry etching resistance as well as high sensitivity to chemical radiation and high resolution and having resistance to the environmental atmosphere through a pattern forming process. SOLUTION: This photosensitive compsn. contains a compd. represented by the formula and a compd. which generates an acid when irradiated with chemical radiation. In the formula, Ar is a benzene ring or a condensed arom. ring, X is a divalent org. group, Y is H or a monovalent org. group, Z is a monovalent org. group or halogen, R is an acid-decomposable substituent, each of (a) and (b) is 0 or a positive integer, each of (m) and (n) is a number of 0-1 and m+n=1. |
