| 摘要 |
The present invention provides a phase-inverted mask and a method of making the same. The inventive mask is formed by using a quartz substrate as a phase-inverted material, and the transmittivity and refractivity can be controlled to increase the processing effect. In the inventive phase-inverted mask, a Cr pattern is formed on each of predetermined parts of a quartz substrate, and a groove is formed by etching a given part between the Cr pattern so that the quartz substrate is phase-inverted.
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