| 摘要 |
<p>PROBLEM TO BE SOLVED: To anneal a TFT part by effectively utilizing the energy of laser light over a large area of a substrate by arranging a lattice-shaped reflecting mirror so that the angle of incidence to a laser optical axis is not zero. SOLUTION: This device is equipped with lattice-shaped reflecting mirrors 2a and 2b which are composed of two metallic members and a total reflecting mirror 3 which is composed of a metallic member as well. And, laser light 1a which has a large diameter and a uniform intensity distribution is made on the 1st lattice-shaped reflecting mirror 2a which is slanted at 45 deg. to the incidence laser optical axis. The lattice-shaped reflecting mirrors 2a and 2b are in the same shape, their laser beam reflection parts are slid and arranged not to overlap the laser beam, and then a 1st reflected beltlike beam 4a and a 2nd reflected beltlike beam 4b which are in the same shape are generated. Since plural beltlike beams 4a and 4b can be generated at equal intervals by providing plural lattice-shaped reflecting mirrors 2a and 2b, the TFT part can selectively be irradiated and annealed by one shot of the laser.</p> |
