发明名称 SUBSTRATE PROCESSING EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To enable necessary and sufficient liquid draining through a small simple constitution by branching a tip to provide an upstream-side gas outlet that opens toward a processing bath on the upstream side and a downstream- side gas outlet that opens toward a processing bath on the downstream side. SOLUTION: An air knife 40 is formed at the upper edge of an opening 13a formed in a partitioning wall 13 that separates a processing bath 2 on the upstream side from a processing bath 3 on the downstream side. Further, an upstream-side gas outlet 43a and a downstream-side gas outlet 44a are so constituted that band-shaped air streams jetted from the gas outlets will traverse a substrate B transported to the opening 13a. When the substrate B goes by the opening 13a, an air stream from the upstream-side gas outlet 43a going toward the upstream side and an air stream from the downstream-side gas outlet 44a going toward the downstream side form an interfacial area where upstream-side processing liquid X and downstream-side processing liquid Y will not be mixed together, on the substrate direct under the air knife 40.
申请公布号 JPH0982592(A) 申请公布日期 1997.03.28
申请号 JP19950238438 申请日期 1995.09.18
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 YOSHITANI MITSUAKI;HATABE YUKIO
分类号 G02F1/1333;H01L21/02;H01L21/304;H01L21/677;H01L21/68;(IPC1-7):H01L21/02;G02F1/133 主分类号 G02F1/1333
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